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ion-implantation processing

См. также в других словарях:

  • Ion implantation — is a materials engineering process by which ions of a material can be implanted into another solid, thereby changing the physical properties of the solid. Ion implantation is used in semiconductor device fabrication and in metal finishing, as… …   Wikipedia

  • Plasma-immersion ion implantation — (PIII) [cite book | title = Materials Science of Thin Films | author = Milton Ohring | publisher = Academic Press | year = 2002 | isbn = 0125249756 | url = http://books.google.com/books?id=SOt yFjV xwC pg=PA267… …   Wikipedia

  • Ion Beam Mixing — is a process for adhering two multilayers, especially a substrate and deposited surface layer. The process involves bombarding layered samples with doses of ion radiation in order to promote mixing at the interface, and generally serves as a… …   Wikipedia

  • Rapid thermal processing — (or RTP) refers to a semiconductor manufacturing process which heats silicon wafers to high temperatures (up to 1200 C or greater) on a timescale of several seconds or less. The wafers must be brought down (temperature) slow enough however, so… …   Wikipedia

  • radiation — radiational, adj. /ray dee ay sheuhn/, n. 1. Physics. a. the process in which energy is emitted as particles or waves. b. the complete process in which energy is emitted by one body, transmitted through an intervening medium or space, and… …   Universalium

  • Silvaco — Infobox Company company name = Silvaco International company company type = Private Company| foundation = 1984 location = key people = Dr Ivan Pesic, President/CEO industry = Software Programming homepage = [http://www.silvaco.com/… …   Wikipedia

  • Materials science — Simulation of the outside of the Space Shuttle as it heats up to over 1,500 °C (2,730 °F) during re entry into the Earth s atmosphere Materials science is an interdisciplinary field applying the properties of matter to various areas of… …   Wikipedia

  • Semiconductor device fabrication — Semiconductor manufacturing processes 10 µm 1971 3 µm 1975 1.5 µm 1982 …   Wikipedia

  • Microfabrication — Synthetic detail of a micromanufactured integrated circuit through four layers of planarized copper interconnect, down to the polysilicon (pink), wells (greyish) and substrate (green) Microfabrication is the term that describes processes of… …   Wikipedia

  • Plasma (physics) — For other uses, see Plasma. Plasma lamp, illustrating some of the more complex phenomena of a plasma, including filamentation. The colors are a result of relaxation of electrons in excited states to lower energy states after they have recombined… …   Wikipedia

  • Paul K. Chu — (朱劍豪) is an internationally known specialist in plasma surface modification and materials science. He is Professor (Chair) of materials engineering at City University of Hong Kong. BiographyHe received his BS in mathematics (cum laude) from The… …   Wikipedia

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